
ITO-E1
ITO-E1 ITO Etchant
Pattern etching of ITO for panels and touch; organic-acid route with excellent selectivity to glass, photoresist and black matrix.
Technical Description
ITO-E1 is an ITO etchant from Shengpu Chemical for panel and touch ITO patterning. Benchmarked against Parker and Zhipu ITO etchants, its organic-acid system — confirmed by vendors, patents and academic literature as the industry mainstream — is chlorine-free, free of metal-ion contamination and highly selective to glass, photoresist and black matrix (ITO:photoresist >10:1), with working concentration already inside the common commercial window for easy customer qualification. A classic inorganic-acid fast option offers 2–3x higher etch rate for high-speed lines, and etch-rate calibration per ITO crystalline phase (amorphous vs. polycrystalline) is available to stabilize mass production.
Introduction
ITO-E1 ITO Etchant (ITO-E1) is developed by SEMPURION for ITO glass as a Etching / Thinning product.Key advantage: Pattern etching of ITO for panels and touch; organic-acid route with excellent selectivity to glass, photoresist and black matrix.. Benchmarked against Parker / Zhipu ITO etchants. Key features: Organic-acid system is the mainstream industry route confirmed by vendors, patents and academic literature: chlorine-free, no metal-ion contamination, excellent selectivity to glass/photoresist/black matrix (ITO:photoresist selectivity >10:1), environmentally safe — already the large-scale replacement for traditional inorganic strong-acid etching; working concentration sits in the common commercial window so customers can qualify without adjustment; a classic inorganic-acid fast option is also offered with 2–3x higher etch rate for high-speed lines; etch-rate curve calibration available per customer ITO crystalline phase (amorphous/polycrystalline rates differ widely and calibration is required for stable production). Typical process: Option A: etch rate 30–60 nm/min at 40–45°C (acceptance recommended at 30–50 nm/min). Option B: fast etch 30–90 s at 30–40°C; rinse thoroughly after etching to remove residual ions; glass stays clear (weight loss <0.01% in 30 min); indium/tin waste liquor managed as hazardous waste.
Quick Specs
Features
Organic-acid system is the mainstream industry route confirmed by vendors, patents and academic literature: chlorine-free, no metal-ion contamination, excellent selectivity to glass/photoresist/black matrix (ITO:photoresist selectivity >10:1), environmentally safe — already the large-scale replacement for traditional inorganic strong-acid etching; working concentration sits in the common commercial window so customers can qualify without adjustment; a classic inorganic-acid fast option is also offered with 2–3x higher etch rate for high-speed lines; etch-rate curve calibration available per customer ITO crystalline phase (amorphous/polycrystalline rates differ widely and calibration is required for stable production)
Process & Usage
Option A: etch rate 30–60 nm/min at 40–45°C (acceptance recommended at 30–50 nm/min). Option B: fast etch 30–90 s at 30–40°C; rinse thoroughly after etching to remove residual ions; glass stays clear (weight loss <0.01% in 30 min); indium/tin waste liquor managed as hazardous waste
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- Phone
- +86 769-82786068
- sales@sempurion.com
- Website
- www.sempurion.com
- Address
- Songshan Lake, Dongguan, Guangdong, China