解键合残留清洗液
Semiconductor & PackagingCarrier / Wafer

DB-100

解键合残留清洗液

临时键合解键合后胶残留清洗

Technical Description

解键合残留清洗液(DB-100)是圣普化学面向减薄晶圆/载板场景开发的载具/晶圆产品——面向精密制程的清洗化学品。技术性能对标SUSS/Brewer Science 配套解键合清洗液,提供国产化替代方案。核心卖点:临时键合解键合后胶残留清洗。

主要适用材质/对象:减薄晶圆/载板。

服务于半导体制造与先进封装产线的良率与洁净度需求。

Introduction

解键合残留清洗液 (DB-100) is developed by SEMPURION for 减薄晶圆/载板 as a 载具/晶圆 product.Key advantage: 临时键合解键合后胶残留清洗. Benchmarked against SUSS/Brewer Science 配套解键合清洗液 as a domestic alternative. Key features: 水基体系闭杯闪点 >60°C,加热操作安全. Typical process: 50-70°C 浸泡/喷淋 5-20min(有机硅胶可先预溶胀 5min 再入槽),DI 水漂洗 2-3 次,必要时兆声漂洗.

Quick Specs

Benchmark
SUSS/Brewer Science 配套解键合清洗液
Application
减薄晶圆/载板
Materials
减薄晶圆/载板

Features

水基体系闭杯闪点 >60°C,加热操作安全

Process & Usage

50-70°C 浸泡/喷淋 5-20min(有机硅胶可先预溶胀 5min 再入槽),DI 水漂洗 2-3 次,必要时兆声漂洗

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