DB-100 Temporary Bonding De-Bonding Residue Cleaner
Semiconductor & PackagingCarrier / Wafer

DB-100

DB-100 Temporary Bonding De-Bonding Residue Cleaner

Removes adhesive residue left after temporary bonding/de-bonding; water-based with a closed-cup flash point above 60°C for safe heated operation.

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Technical Description

DB-100 is a water-based cleaner from Shengpu Chemical that removes adhesive residue after temporary bonding de-bonding of thinned wafers and carrier substrates. Benchmarked against SUSS/Brewer Science companion de-bonding cleaners, its formulation offers a closed-cup flash point above 60°C for safe heated operation by immersion or spray at 50–70°C, supporting yield and cleanliness in semiconductor manufacturing and advanced packaging lines.

Introduction

DB-100 Temporary Bonding De-Bonding Residue Cleaner (DB-100) is developed by SEMPURION for Thinned wafers and carrier substrates as a Carrier / Wafer product.Key advantage: Removes adhesive residue left after temporary bonding/de-bonding; water-based with a closed-cup flash point above 60°C for safe heated operation.. Benchmarked against SUSS / Brewer Science companion de-bonding cleaners. Key features: Water-based system with closed-cup flash point >60°C; safe for heated operation. Typical process: Immersion or spray at 50–70°C for 5–20 min (silicone adhesives may be pre-swollen 5 min before bath); DI water rinse 2–3 times; megasonic rinse if needed.

Quick Specs

Benchmark
SUSS / Brewer Science companion de-bonding cleaners
Application
Thinned wafers and carrier substrates
Materials
Thinned wafers/carrier substrates

Features

Water-based system with closed-cup flash point >60°C; safe for heated operation

Process & Usage

Immersion or spray at 50–70°C for 5–20 min (silicone adhesives may be pre-swollen 5 min before bath); DI water rinse 2–3 times; megasonic rinse if needed

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