RD-D1 RDL Developer
Semiconductor & PackagingEtching / Developing

RD-D1

RD-D1 RDL Developer

Packaging-grade standard developer system for RDL processes; electronic-grade purity with no metal ions (MIF).

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Technical Description

RD-D1 is a packaging-grade developer from Shengpu Chemical for RDL processes in advanced packaging. Benchmarked against TOK/Parker systems, it is metal-ion-free with Na⁺, K⁺ and Fe³⁺ each held below 0.5 ppm — alkali migration into devices causing leakage is treated as a red-line item — and its non-silicone defoamer suits spray development. The developer runs at a constant 23±0.5°C by immersion or low-pressure spray; as a highly toxic chemical (CLP-classified dermal hazard) it requires dual-person controlled storage and immediate water flushing for 15 minutes plus medical attention on any skin contact.

Introduction

RD-D1 RDL Developer (RD-D1) is developed by SEMPURION for Advanced packaging RDL layers as a Etching / Developing product.Key advantage: Packaging-grade standard developer system for RDL processes; electronic-grade purity with no metal ions (MIF).. Benchmarked against TOK / Parker. Key features: Electronic-grade purity, metal-ion-free (MIF); Na⁺/K⁺/Fe³⁺ each controlled <0.5 ppm (alkali-metal migration into devices causing leakage is a red-line item); non-silicone defoamer suited to spray development. Typical process: Use at constant 23±0.5°C; immersion 60–120 s or low-pressure spray 30–60 s; rinse with DI water immediately after development; concentrate and working bath managed as a highly toxic chemical (dangerous via dermal absorption — dual-person, dual-lock ledger control; on contact flush with water for 15 min and seek medical attention).

Quick Specs

Benchmark
TOK / Parker
Application
Advanced packaging RDL layers
Materials
Advanced packaging RDL

Features

Electronic-grade purity, metal-ion-free (MIF); Na⁺/K⁺/Fe³⁺ each controlled <0.5 ppm (alkali-metal migration into devices causing leakage is a red-line item); non-silicone defoamer suited to spray development

Process & Usage

Use at constant 23±0.5°C; immersion 60–120 s or low-pressure spray 30–60 s; rinse with DI water immediately after development; concentrate and working bath managed as a highly toxic chemical (dangerous via dermal absorption — dual-person, dual-lock ledger control; on contact flush with water for 15 min and seek medical attention)

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