SP-Clear Mask
SP-Clear Mask — Neutral Cleaner for Mask/Reticle Boxes
Neutral cleaner for mask and reticle storage boxes: 1:4 dilution (UPW recommended), pH 6.5–7.5, clean at 40–60 °C for 5–10 min; GLDA+EDTA dual chelation for Haze control
Technical Description
SP-Clear Mask is the neutral cleaner in SEMPURION's SP-Clear semiconductor cleaning series for mask and reticle storage boxes in ABS / PC ESD / metal, with ion removal (Haze prevention) and particle removal as its core functions. Supplied as a colorless clear concentrate recommended at 1:4 (concentrate : UPW ultrapure water).
Its Haze control comes from a GLDA + EDTA dual chelation system that captures ions such as NH₄⁺ / SO₄²⁻, inhibiting fungal growth on mask boxes at the source. The working solution is neutral at pH 6.5–7.5, fully safe for ABS / PC material, with a recommended working temperature of 40–60 °C (mask boxes do not tolerate high heat) and a cleaning time of 5–10 minutes to complete ion chelation.
Key practice: dilute with UPW (ultrapure water) to lower background ionic content and secure Haze control. The standard process is: chemical clean (40–60 °C, 5–10 min) → UPW rinse (3–5 cycles — UPW required) → N₂ blow-dry (avoid hot air, which introduces particles) → ion check (IC / ICP-MS). The product is neutral and mild; gloves are recommended, cleanroom wipers should be used for manual wiping, and mask boxes should be dried and packed in a Class 100 or better environment. Packaging is 5 / 25 / 200 kg drums, stored sealed and cool at 5–35 °C with a 12-month unopened shelf life.
Positioning & Scope
| Positioning | Cleaner for mask and reticle storage boxes — Haze prevention |
| Suitable for | Mask boxes in ABS / PC ESD / metal |
| Form | Colorless clear liquid (concentrate) |
Dilution
| Ratio | Procedure | Working solution |
|---|---|---|
| 1 : 4 (concentrate : UPW ultrapure water) | 1 part concentrate + 4 parts UPW, stir until uniform | 5 parts working solution |
⚠️ UPW (ultrapure water) dilution is recommended to lower background ionic content and secure Haze control.
Working-solution parameters
| Parameter | Value | Notes |
|---|---|---|
| pH | 6.5 – 7.5 | Neutral — fully safe for ABS / PC |
| Operating temp. | 40 – 60 °C | Mask boxes do not tolerate high temperature |
| Cleaning time | 5 – 10 min | Allows full ion chelation |
| Ion removal | Chelating capture of NH₄⁺ / SO₄²⁻ | GLDA + EDTA dual chelation system |
Cleaning process
- 1SP-Clear Mask chemical clean (40 – 60 °C, 5 – 10 min)
- 2UPW rinse (3 – 5 cycles — UPW required)
- 3N₂ blow dry (avoid hot air, which introduces particles)
- 4Ion check (IC / ICP-MS to confirm no residue)
Packaging & Storage
| Packaging | Drums 5 / 25 / 200 kg |
| Order code | SCP-MK-05 / 25 / 200 |
| Storage | Sealed, cool and dry at 5 – 35 °C |
| Shelf life | 12 months (unopened) |
Safety notes
- ·Neutral, mild and non-irritating
- ·Gloves recommended during handling (keeps the mask box clean)
- ·Use a cleanroom wiper if manual wiping is required
- ·After cleaning, dry and pack mask boxes in a Class 100 or better environment
Same series (SP-Clear)
The SP-Clear series is segmented by carrier material and contaminant type; used together it covers the full cleaning chain for FOUP / FOSB / PFA carriers / mask boxes.
Introduction
SP-Clear Mask — Neutral Cleaner for Mask/Reticle Boxes (SP-Clear Mask) is developed by SEMPURION for Ion and particle removal from mask and reticle storage boxes in ABS / PC ESD / metal, preventing Haze (fungal growth) as a Carrier / Wafer product.Key advantage: Neutral cleaner for mask and reticle storage boxes: 1:4 dilution (UPW recommended), pH 6.5–7.5, clean at 40–60 °C for 5–10 min; GLDA+EDTA dual chelation for Haze control. Benchmarked against Industry-standard Haze-control cleaning for mask boxes, offered as a domestic alternative. Key features: GLDA + EDTA dual chelation capturing NH₄⁺ / SO₄²⁻ to control Haze at the source; neutral pH 6.5–7.5, fully safe for ABS / PC; operating temperature 40–60 °C (mask boxes do not tolerate high heat); 5–10 min cleaning for full ion chelation; UPW (ultrapure water) dilution recommended to lower background ionic content; N₂ blow-dry and IC / ICP-MS verification of zero ionic residue afterwards. Typical process: Process: SP-Clear Mask chemical clean (40–60 °C, 5–10 min) → UPW rinse (3–5 cycles — UPW required) → N₂ blow-dry (avoid hot air, which introduces particles) → ion check (IC / ICP-MS to confirm no residue). Dilution: 1 part concentrate + 4 parts UPW = 5 parts working solution. Packaging: 5 / 25 / 200 kg drums (SCP-MK-05/25/200); storage 5–35 °C sealed and cool, 12 months unopened; after cleaning, dry and pack mask boxes in a Class 100 or better environment.
Quick Specs
Features
GLDA + EDTA dual chelation capturing NH₄⁺ / SO₄²⁻ to control Haze at the source; neutral pH 6.5–7.5, fully safe for ABS / PC; operating temperature 40–60 °C (mask boxes do not tolerate high heat); 5–10 min cleaning for full ion chelation; UPW (ultrapure water) dilution recommended to lower background ionic content; N₂ blow-dry and IC / ICP-MS verification of zero ionic residue afterwards
Process & Usage
Process: SP-Clear Mask chemical clean (40–60 °C, 5–10 min) → UPW rinse (3–5 cycles — UPW required) → N₂ blow-dry (avoid hot air, which introduces particles) → ion check (IC / ICP-MS to confirm no residue). Dilution: 1 part concentrate + 4 parts UPW = 5 parts working solution. Packaging: 5 / 25 / 200 kg drums (SCP-MK-05/25/200); storage 5–35 °C sealed and cool, 12 months unopened; after cleaning, dry and pack mask boxes in a Class 100 or better environment
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- Phone
- +86 769-82786068
- sales@sempurion.com
- Website
- www.sempurion.com
- Address
- Songshan Lake, Dongguan, Guangdong, China