DER-100
DER-100 Dry-Etch & Ash Polymer Residue Remover
Efficient removal of polymer residues after dry etch and ashing; water-based with high closed-cup flash point for safe operation at 70°C.
Technical Description
DER-100 is a water-based residue remover from Shengpu Chemical that strips post-etch polymer residues left by dry etch and ashing on wafers and substrates. Benchmarked against comparable industry products, its water-based system offers a high closed-cup flash point for safe operation up to 70°C, applied ready-to-use by immersion, spray or ultrasonic before DI rinsing, supporting yield and cleanliness in semiconductor manufacturing and advanced packaging lines.
Introduction
DER-100 Dry-Etch & Ash Polymer Residue Remover (DER-100) is developed by SEMPURION for Dry-etched wafers and substrates as a Carrier / Wafer product.Key advantage: Efficient removal of polymer residues after dry etch and ashing; water-based with high closed-cup flash point for safe operation at 70°C.. Benchmarked against Industry-standard dry-etch residue removal, offered as a domestic alternative. Key features: Water-based system with high closed-cup flash point; safe for 70°C high-temperature operation. Typical process: Ready-to-use (RTU); immersion, spray or ultrasonic at 55–70°C for 5–15 min (heavy residue: 70°C ultrasonic 15 min); DI water rinse 2–3 times.
Quick Specs
Features
Water-based system with high closed-cup flash point; safe for 70°C high-temperature operation
Process & Usage
Ready-to-use (RTU); immersion, spray or ultrasonic at 55–70°C for 5–15 min (heavy residue: 70°C ultrasonic 15 min); DI water rinse 2–3 times
Need samples or datasheets?
Contact us for detailed specs, MSDS and sample support for DER-100
Need technical support or a sample?
Tell us your substrate, contamination and process conditions — our process engineers will recommend a grade and arrange sample validation.
- Phone
- +86 769-82786068
- sales@sempurion.com
- Website
- www.sempurion.com
- Address
- Songshan Lake, Dongguan, Guangdong, China