SP-Clear Organic — Mildly Alkaline Organic-removal Cleaner
Semiconductor & PackagingCarrier / Wafer

SP-Clear Organic

SP-Clear Organic — Mildly Alkaline Organic-removal Cleaner

Flagship of the SP-Clear series: primary product for organic contamination and VOC removal on FOUP/FOSB — 1:4 dilution, pH 8.5–9.5, clean at 55–75 °C for 5–10 min; HSP verified RED=0.59

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Technical Description

SP-Clear Organic is the flagship of SEMPURION's SP-Clear semiconductor cleaning series, targeting organic contamination and VOC removal on FOUP/FOSB in PC ESD / CBM ESD. Supplied as a light-yellow clear concentrate diluted 1:4 (concentrate : DI water), it has passed HSP (Hansen solubility parameter) matching with RED=0.59 — excellent solvency for photoresist outgassing products.

A dedicated surfactant system works with PM + Butyl Carbitol dual solvents: the working solution is pH 8.5–9.5, the safe upper limit for PC ESD material; recommended working temperature is 55–75 °C, where higher temperature boosts organic removal, and cleaning takes 5–10 minutes — as the flagship product it deserves the full reaction time. Foam height is below 5 mm (Ross-Miles at 70 °C) with surface tension below 28 mN/m. Removal spectrum: photoresist outgassing residue and VOC excellent; organic film good (mild alkali + solvent synergy); particles good when combined with pre-wash (surfactant + chelator dispersion).

The standard process is: pre-rinse (DI water, 1–2 min) → chemical clean (55–75 °C, 5–10 min — the critical step, hold time and temperature) → DI rinse (2–4 cycles, UPW recommended) → N₂ blow-dry. The product contains organic solvents: gloves are recommended and the area should stay ventilated; flash point is above 61 °C, so it is not a flammable liquid. Packaging is 5 / 25 / 200 kg drums and 1000 kg IBC, stored sealed and cool at 5–35 °C with a 12-month unopened shelf life.

01

Positioning & Scope

PositioningFlagship product for organic contamination / VOC removal on FOUP/FOSB
Suitable forFOUP & FOSB in PC ESD / CBM ESD
FormLight-yellow clear liquid (concentrate)
02

Dilution

RatioProcedureWorking solution
1 : 4 (concentrate : DI water)1 part concentrate + 4 parts DI water, stir until uniform5 parts working solution
03

Working-solution parameters

ParameterValueNotes
pH8.5 – 9.5Mildly alkaline — at the safe upper limit for PC ESD
Operating temp.55 – 75 °CHigher temperature boosts organic removal
Cleaning time5 – 10 minFlagship product — allow full reaction time
Foam height< 5 mmRoss-Miles test at 70 °C
Surface tension< 28 mN/mContains PM + Butyl Carbitol dual solvents
04

Cleaning process

  1. 1Pre-rinse (DI water, 1 – 2 min)
  2. 2SP-Clear Organic chemical clean (55 – 75 °C, 5 – 10 min) ← critical: hold time and temperature
  3. 3DI rinse (2 – 4 cycles, UPW)
  4. 4N₂ blow-off drying

Verified: passed HSP evaluation (RED = 0.59) — excellent solvency for photoresist outgassing residues.

05

Contaminants addressed

ContaminantRemovalNotes
Photoresist outgassing residueExcellentHSP verified, RED = 0.59
VOCExcellentPM + Butyl Carbitol dual dissolution
Organic filmGoodMild alkali + solvent synergy
Particles (with pre-wash)GoodSurfactant + chelator dispersion
06

Packaging & Storage

PackagingDrums 5 / 25 / 200 kg; IBC bulk 1000 kg
Order codeSCP-OG-05 / 25 / 200 | SCP-OG-1000 (IBC)
StorageSealed, cool and dry at 5 – 35 °C
Shelf life12 months (unopened)
07

Safety notes

  • ·Contains organic solvents (PM + Butyl Carbitol); gloves recommended
  • ·Keep the working area well ventilated (slight solvent volatilisation)
  • ·Flash point > 61 °C — not classified as a flammable liquid
  • ·If it gets in the eyes, rinse with plenty of water for 15 minutes
08

Same series (SP-Clear)

The SP-Clear series is segmented by carrier material and contaminant type; used together it covers the full cleaning chain for FOUP / FOSB / PFA carriers / mask boxes.

Introduction

SP-Clear Organic — Mildly Alkaline Organic-removal Cleaner (SP-Clear Organic) is developed by SEMPURION for Removal of organic contamination, photoresist outgassing residue and VOC from FOUP and FOSB in PC ESD / CBM ESD as a Carrier / Wafer product.Key advantage: Flagship of the SP-Clear series: primary product for organic contamination and VOC removal on FOUP/FOSB — 1:4 dilution, pH 8.5–9.5, clean at 55–75 °C for 5–10 min; HSP verified RED=0.59. Benchmarked against Industry-standard organic cleaning for FOUP/FOSB, offered as a domestic alternative. Key features: Passed HSP (Hansen solubility parameter) matching with RED=0.59 — excellent solvency for photoresist outgassing products; contains PM + Butyl Carbitol dual solvents, surface tension <28 mN/m; mildly alkaline pH 8.5–9.5 at the safe upper limit for PC ESD; 55–75 °C working temperature boosts organic removal; foam <5 mm (Ross-Miles at 70 °C); flash point >61 °C — not a flammable liquid. Typical process: Process: pre-rinse (DI water, 1–2 min) → chemical clean (55–75 °C, 5–10 min; critical step — hold time and temperature) → DI rinse (2–4 cycles, UPW) → N₂ blow-dry. Removal spectrum: photoresist outgassing residue excellent (HSP RED=0.59), VOC excellent, organic film good, particles good (with pre-wash). Dilution: 1 part concentrate + 4 parts DI water = 5 parts working solution. Packaging: 5 / 25 / 200 kg drums (SCP-OG-05/25/200), 1000 kg IBC (SCP-OG-1000); storage 5–35 °C sealed and cool, 12 months unopened; keep the working area ventilated.

Quick Specs

Benchmark
Industry-standard organic cleaning for FOUP/FOSB, offered as a domestic alternative
Application
Removal of organic contamination, photoresist outgassing residue and VOC from FOUP and FOSB in PC ESD / CBM ESD
Materials
FOUP & FOSB in PC ESD / CBM ESD

Features

Passed HSP (Hansen solubility parameter) matching with RED=0.59 — excellent solvency for photoresist outgassing products; contains PM + Butyl Carbitol dual solvents, surface tension <28 mN/m; mildly alkaline pH 8.5–9.5 at the safe upper limit for PC ESD; 55–75 °C working temperature boosts organic removal; foam <5 mm (Ross-Miles at 70 °C); flash point >61 °C — not a flammable liquid

Process & Usage

Process: pre-rinse (DI water, 1–2 min) → chemical clean (55–75 °C, 5–10 min; critical step — hold time and temperature) → DI rinse (2–4 cycles, UPW) → N₂ blow-dry. Removal spectrum: photoresist outgassing residue excellent (HSP RED=0.59), VOC excellent, organic film good, particles good (with pre-wash). Dilution: 1 part concentrate + 4 parts DI water = 5 parts working solution. Packaging: 5 / 25 / 200 kg drums (SCP-OG-05/25/200), 1000 kg IBC (SCP-OG-1000); storage 5–35 °C sealed and cool, 12 months unopened; keep the working area ventilated

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